Running for New Innovation
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Running for New Innovation
Control Your Light
Running for New Innovation
Control Your Light
Running for New Innovation
Control Your Light
Running for New Innovation
Control Your Light
IRCF
The manufacturing process for image sensor filters and IR cut-off filters involves deposition, priniting, dicing and inspection.
Filters undergo multiple deposition cycles with high refractive index and low refractive index material, reducing residual stress and crack on the thin films to ensure reliability and yield of optical devices.
In particular, the image sensor filters strictly control the inflow of fine dust during production and employ an automated high-speed AVI (Automatic Visual Inspection) system.
This advanced system is capable of detectin fine dust and defects smaller than 10μm with precision.
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Film Filter
Film filters, which succeeded in mass-producing black masking film filters for the first time in the world, have the world's largest mass-production capacity and their demand is continuously increasing due to the popularization of multiple cameras in smartphones.
▶ Applicable Products
▶ Features
Specialized Printing
Technology
Detecting Fine Dust and Defect
Manufacturing Capacity
01
Decenter control using
black masking
- 30㎛
02
Controlling fine dust and defects using dedicated AVI System - AR 8㎛ / IR 10㎛
03
World's largest mass production capacity
- 40 million pieces/month
▶ Product Characteristics
Structure
AR Coating
Film
IR Coating
Item
Specification
0.11mm
Cut-On ≤ 3nm
Cut-Off ≤ 5nm
OD Max = 3.8
Very Good
Flare
Strength
Thickness
Color Shift
Characteristics
T50% ≤ 3nm
T10% ≤ 5nm
Cut-On Shift
Cut-Off Shift
NIR Stop Area(%)
Tavg ≥ 88% @ 481-560nm
Visible Pass Area(%)
Tmax ≤ 0.2% @ 851~1050nm
.
.
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Blue Filter
Optrontec has the world's largest mass-production capability of blue filters and its demand is continuously growing up due to the popularization
of multi-camera smartphones.
▶ Applicable Products
▶ Features
Specialized Printing Technology
Detecting Fine Dust and Defect
Manufacturing Capacity
01
Black Masking Decenter Management
- 30㎛
02
Controlling fine dust and
defect s using dedicated AVI System - AR 8㎛ / IR 10㎛
03
World's largest mass production capacity
- 40 million pieces/month
▶ Product Characteristics
Structure
Item
Specification
0.1mm & 0.21mm & 0.300mm
OD Max = 3.8
Good
Flare
Strength
Thickness
Color Shift
Characteristics
T50% < 10nm
T10% < 25nm
Tavg > 90% @ 430-560nm
Pass Area (%)
Cut-On Shift
Cut-Off Shift
AR Coating
Organic Layer
IR Coating
Cut-On ≤ 3nm
Cut-Off ≤ 3nm
Blue Glass
Stop Area(%)
Tmax<0.01% @ 800~1,100nm (OD>4)
.
.
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Organic White Filter
Organic White Filter (OWF), which utilizes toughened glass and organic layers, is constantly increasing in demand due to the popularization of multi-camera smartphones.
▶ Applicable Products
▶ Features
Specialized Printing Technology
Detecting Fine Dust and Defect
Manufacturing Capacity
01
Dedicated Masking Printing System
- 30㎛
02
Controlling fine dust and
defect s using dedicated AVI System - AR 8㎛ / IR 10㎛
03
Thin & High Strength
- 400Mpa
▶ Product Characteristics
Structure
Item
Specification
AR Coating
Organic Layer
IR Coating
Glass
0.1mm & 0.21mm
Cut-On ≤ 10nm
Cut-Off ≤ 5nm
OD Max = 3.5
Good
Flare
Strength
Thickness
Color Shift
Characteristics
T50% < 10nm
T10% < 10nm
Tavg ≥ 88% @ 476-560nm
Pass Area (%)
Cut-On Shift
Cut-Off Shift
Stop AreaT(%)
Tmax ≤ 0.1% @ 851~950nm (OD>3)
.
.
.
■
Slim Film Filter
This is an IRCC based on film raw materials that can overcome the slimming limitations of glass-based IRCF raw materials.
The market is expanding as a slim IRCF that implements IRCF characteristics with a thickness of 0.11 mm.
▶ 적용부문
▶ Features
Specialized Printing Technology
Detecting Fine Dust and Defect
Manufacturing Capacity
01
Dedicated Masking Printing System
- 30㎛
02
Controlling fine dust and
defect s using dedicated AVI System - AR 8㎛ / IR 10㎛
03
Thin & High Strength
- 400Mpa
▶ Product Characteristics
Item
Specification
Structure
AR Coating
Film
IR Coating
Thickness
Thickness 0.11mm
Color Shift
Cut-On ≤ 10nm
Cut-Off ≤ 5nm
Flare
OD Max = 3.5
Very Good
Strength
Characteristics
Cut-On Shift
T50% ≤ 3nm
Cut-Off Shift
T10% ≤ 3nm
NIR Stop Area(%)
Tmax <0.1%
Visible Pass Area(%)
Tavg ≥ 90%
.
.
.